Serveur d'exploration sur le nickel au Maghreb

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Kinetics of growth and consumption of Ni rich phases

Identifieur interne : 000107 ( Main/Exploration ); précédent : 000106; suivant : 000108

Kinetics of growth and consumption of Ni rich phases

Auteurs : G. Tellouche-Derafa [Algérie, France] ; K. Hoummada [France] ; A. Derafa [Algérie] ; I. Blum [France] ; A. Portavoce [France] ; D. Mangelinck [France]

Source :

RBID : Pascal:14-0138911

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English descriptors

Abstract

In situ X-ray diffraction measurements performed during isothermal annealing show that the life time of θ-Ni2Si depends on the initial Ni thickness. A slow kinetic of consumption of θ-Ni2Si is observed during the reaction of 50 nm Ni with Si substrate, while a fast rate of consumption of θ-Ni2Si is observed when θ-Ni2Si is a transient phase. The kinetics of growth and consumption of Ni-rich phases is discussed.


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Le document en format XML

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<div type="abstract" xml:lang="en">In situ X-ray diffraction measurements performed during isothermal annealing show that the life time of θ-Ni
<sub>2</sub>
Si depends on the initial Ni thickness. A slow kinetic of consumption of θ-Ni
<sub>2</sub>
Si is observed during the reaction of 50 nm Ni with Si substrate, while a fast rate of consumption of θ-Ni
<sub>2</sub>
Si is observed when θ-Ni
<sub>2</sub>
Si is a transient phase. The kinetics of growth and consumption of Ni-rich phases is discussed.</div>
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